Gate length scaling and high drive currents enabled for high performance SOI technology using high-κ/metal gate
- K. Henson
- H. Bu
- et al.
- 2008
- IEDM 2008
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3 results for Rashmi Jha
A cost effective 32nm high-K/metal gate CMOS technology for low power applications with single-metal/gate-first process
- X. Chen
- S. Samavedam
- et al.
- 2008
- VLSI Technology 2008
Study of synaptic behavior in doped transition metal oxide-based reconfigurable devices
- Saptarshi Mandal
- Branden Long
- et al.
- 2013
- IEEE T-ED