Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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8 results for Dimitris P Ioannou

2^nd Generation dual-channel optimization with cSiGe for 22nm HP technology and beyond
- - C. Ortolland
  - Daniel Jaeger
  - et al.
- 2013
- IEDM 2013
22nm High-performance SOI technology featuring dual-embedded stressors, Epi-Plate High-K deep-trench embedded DRAM and self-aligned Via 15LM BEOL
- - S. Narasimha
  - P. Chang
  - et al.
- 2012
- IEDM 2012
A manufacturable dual channel (Si and SiGe) high-k metal gate CMOS technology with multiple oxides for high performance and low power applications
- - S. Krishnan
  - U. Kwon
  - et al.
- 2011
- IEDM 2011
Bias temperature instability in high-κ/metal gate transistors - Gate stack scaling trends
- - Siddarth Krishnan
  - Vijay Narayanan
  - et al.
- 2012
- IRPS 2012
A robust reliability methodology for accurately predicting Bias Temperature Instability induced circuit performance degradation in HKMG CMOS
- - D.P. Ioannou
  - K. Zhao
  - et al.
- 2011
- IRPS 2011
PBTI response to interfacial layer thickness variation in Hf-based HKMG nFETs
- - D.P. Ioannou
  - E. Cartier
  - et al.
- 2010
- IRPS 2010
High performance 32nm SOI CMOS with high-k/metal gate and 0.149μm ² SRAM and ultra low-k back end with eleven levels of copper
- - B. Greene
  - Q. Liang
  - et al.
- 2009
- VLSI Technology 2009
Effect of plasma N₂ and thermal NH₃ nitridation in HfO₂ for ultrathin equivalent oxide thickness
- - Min Dai
  - Yanfeng Wang
  - et al.
- 2013
- Journal of Applied Physics