Dissolution fundamentals of 193-nm methacrylate based photoresists
- Ashwin Rao
- Shuhui Kang
- et al.
- 2006
- SPIE Advanced Lithography 2006
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9 results for Bryan D. Vogt
Interfacial structure of photoresist thin films in developer solutions
- Vivek M. Prabhu
- Bryan D. Vogt
- et al.
- 2005
- Microlithography 2005
Measurements of water distribution in thin lithographic films
- Bryan D. Vogt
- Christopher L. Soles
- et al.
- 2004
- Microlithography 2004
Fundamentals of developer-resist interactions for line-edge roughness and critical dimension control in model 248 nm and 157 nm photoresists
- Vivek M. Prabhu
- Michael X. Wang
- et al.
- 2004
- Microlithography 2004
Anisotropic mechanical properties of aligned polystyrene-block- polydimethylsiloxane thin films
- Changhuai Ye
- Gurpreet Singh
- et al.
- 2013
- Macromolecules
Effect of porogen molecular architecture and loading on structure of porous thin films
- Hae-Jeong Lee
- Christopher L. Soles
- et al.
- 2008
- Chemistry of Materials
Direct measurement of the counterion distribution within swollen polyelectrolyte films
- Vivek M. Prabhu
- Bryan D. Vogt
- et al.
- 2005
- Langmuir
Water immersion of model photoresists: Interfacial influences on water concentration and surface morphology
- Bryan D. Vogt
- Christopher L. Soles
- et al.
- 2005
- Journal of Microlithography, Microfabrication and Microsystems
Interfacial effects on moisture absorption in thin polymer films
- Bryan D. Vogt
- Christopher L. Soles
- et al.
- 2004
- Langmuir