Paving the way to a full chip gate level double patterning application
- Henning Haffner
- Jason Meiring
- et al.
- 2007
- SPIE Photomask Technology + EUV Lithography 2007
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13 results for Jason Meiring
Modeling polarization for Hyper-NA lithography tools and masks
- Kafai Lai
- Alan E. Rosenbluth
- et al.
- 2007
- SPIE Advanced Lithography 2007
Mesoscale modeling for SFIL simulating polymerization kinetics and densification
- Ryan L. Burns
- Stephen C. Johnson
- et al.
- 2004
- Microlithography 2004