Thin film composite polyamide membrane containing hexafluoroalcohol (HFA) functionality for water desalination
- Young-Hye Na
- Ratnam Sooriyakumaran
- et al.
- 2010
- NAMS-ICIM 2010
Publications
Date
Featured collections
Popular topics
76 results for R. Sooriyakumaran
Leveraging resist chemistry research for water purification membrane technology
- Robert D. Allen
- Young-Hye Na
- et al.
- 2010
- J. Photopolym. Sci. Tech.
Multi-level integration of patternable low-κ material into advanced Cu BEOL
- Qinghuang Lin
- Shyng-Tsong Chen
- et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010
A silicon-containing resist for immersion lithography
- Ratnam Sooriyakumaran
- Wu-Song Huang
- et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010
Novel thin film composite membrane containing ionizable hydrophobes: PH-dependent reverse osmosis behavior and improved chlorine resistance
- Young-Hye La
- Ratnam Sooriyakumaran
- et al.
- 2010
- Journal of Materials Chemistry
Integration of photo-patternable low-κ material into advanced Cu back-end-of-the-line
- Qinghuang Lin
- Alshakim Nelson
- et al.
- 2010
- Japanese Journal of Applied Physics
Solution photochemistry of poly(dialkylsilanes): A new class of photoresists
- Josef Michl
- John W. Downing
- et al.
- 2009
- Pure and Applied Chemistry
The limitations of high index resists for 193nm hyper-NA lithography
- Gregory McIntyre
- Daniel Sanders
- et al.
- 2008
- SPIE Advanced Lithography 2008
A new class of low bake resists for 193-nm immersion lithography
- Ratnam Sooriyakumaran
- Richard DiPietro
- et al.
- 2008
- SPIE Advanced Lithography 2008
A fundamental study on dissolution behavior of high-resolution molecular glass photoresists
- Anuja De Silva
- Linda K. Sundberg
- et al.
- 2008
- Chemistry of Materials