Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

Date

Start

End

Featured collections

Popular topics

76 results for R. Sooriyakumaran

Hexafluoroalcohol (HFA) containing molecular resist materials for high resolution lithographic applications
- - Anuja De Silva
  - Linda K. Sundberg
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Extending photo-patternable low-κ concept to 193 nm lithography and e-beam lithography
- - Qinghuang Lin
  - Alshakim Nelson
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Thin film composite polyamide membrane containing hexafluoroalcohol (HFA) functionality for water desalination
- - Young-Hye Na
  - Ratnam Sooriyakumaran
  - et al.
- 2010
- NAMS-ICIM 2010
Patternable low-κ material for "greener" semiconductor manufacturing
- - Qinghuang Lin
  - Shyng-Tsong Chen
  - et al.
- 2010
- ICSICT 2010
Multi-level integration of patternable low-κ material into advanced Cu BEOL
- - Qinghuang Lin
  - Shyng-Tsong Chen
  - et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010
A silicon-containing resist for immersion lithography
- - Ratnam Sooriyakumaran
  - Wu-Song Huang
  - et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010
The limitations of high index resists for 193nm hyper-NA lithography
- - Gregory McIntyre
  - Daniel Sanders
  - et al.
- 2008
- SPIE Advanced Lithography 2008
A new class of low bake resists for 193-nm immersion lithography
- - Ratnam Sooriyakumaran
  - Richard DiPietro
  - et al.
- 2008
- SPIE Advanced Lithography 2008
Fluoroalcohol materials with tailored interfacial properties for immersion lithography
- - Daniel P. Sanders
  - Linda K. Sundberg
  - et al.
- 2007
- SPIE Advanced Lithography 2007
Contact angles & structure/surface property relationships of immersion materials 65191Q
- - Linda K. Sundberg
  - Daniel P. Sanders
  - et al.
- 2007
- SPIE Advanced Lithography 2007