Polysilanes: photochemistry and deep UV lithography
- R.D. Miller
- G.M. Wallraff
- et al.
- 1988
- SPE Regional Technical Conference 1988
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76 results for R. Sooriyakumaran
TWO-PHOTON ABSORPTION INDUCED EFFECTS IN CRYSTALLINE POLYSILANE FILMS
- F.M. Schellenberg
- R.L. Byer
- et al.
- 1988
- IQEC 1988
Leveraging resist chemistry research for water purification membrane technology
- Robert D. Allen
- Young-Hye Na
- et al.
- 2010
- J. Photopolym. Sci. Tech.
Solution photochemistry of poly(dialkylsilanes): A new class of photoresists
- Josef Michl
- John W. Downing
- et al.
- 2009
- Pure and Applied Chemistry
Nanoimprint materials systems
- F.A. Houle
- D.C. Miller
- et al.
- 2008
- J. Photopolym. Sci. Tech.
Fundamental properties of fluoroalcohol-methacrylate polymers for use in 193nm lithography
- R.D. Allen
- G. Breyta
- et al.
- 2006
- J. Photopolym. Sci. Tech.
Positive resists based on non-polymeric macromolecules
- Ratnam Sooriyakumaran
- Hoa Truong
- et al.
- 2005
- J. Photopolym. Sci. Tech.
Fluoroalcohol-methacrylate resists for 193nm lithography
- P.R. Varanasi
- R.W. Kwong
- et al.
- 2005
- J. Photopolym. Sci. Tech.
Cyclic olefm resist polymers and polymerizations for improved etch resistance
- R.D. Allen
- Juliann Opitz
- et al.
- 1999
- J. Photopolym. Sci. Tech.
Platform-dependent properties of 193nm single layer resists
- Robert D. Allen
- Thomas I. Wallow
- et al.
- 1998
- J. Photopolym. Sci. Tech.