Defects on high resolution negative-tone resist The revenge of the blobs
- M.I. Sanchez
- L.K. Sundberg
- et al.
- 2013
- SPIE Photomask Technology + EUV Lithography 2013
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Two complementary methods to characterize long range proximity effects due to develop loading
- Linda K. Sundberg
- Greg M. Wallraff
- et al.
- 2010
- SPIE Photomask Technology + EUV Lithography 2010