Spatially Resolved Diffusion of Aluminum in 4H-SiC during Postimplantation Annealing
- Johanna Muting
- Viktor Bobal
- et al.
- 2020
- IEEE T-ED
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.