Recent progress in electron-beam resists for advanced mask-making
- D. Medeiros
- A. Aviram
- et al.
- 2001
- IBM J. Res. Dev
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26 results for Ranee Kwong
Extending the performance of KRS-XE for high throughput electron beam lithography for advanced mask making
- David R. Medeiros
- Karen E. Petrillo
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Photoresists using tetrahydropyranyl- and tetrahydrofuranyl-protected styrene maleic anhydride half-ester polymers
- Wu-Song Huang
- Ratnam Sooriyakumaran
- et al.
- 1998
- Microlithography 1998
A method to improve setup and overlay performance on an excimer laser stepper using a unique DUV resist-KRS
- Karen Petrillo
- James Brancaccio
- et al.
- 1997
- Microlithography 1997
Improved underlayers for acid amplified resists
- H.S. Sachdev
- R.W. Kwong
- et al.
- 1994
- Microelectronic Engineering
New environmentally stable positive tone chemically amplified resist system - KRS
- Wu-Song Huang
- R.W. Kwong
- et al.
- 1993
- MRS Fall Meeting 1993