Benchmarking study of 3D mask modeling for 2 and 1x nodes
- Chang An Wang
- Chao-Chun Liang
- et al.
- 2013
- SPIE Advanced Lithography 2013
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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4 results for Chidam Kallingal
C-Quad polarized illumination for back end thin wire: Moving beyond annular illumination regime
- Sohan Singh Mehta
- Hyung-Rae Lee
- et al.
- 2009
- SPIE Advanced Lithography 2009
Improvements in accuracy of dense OPC models
- Chidam Kallingal
- James Oberschmidt
- et al.
- 2008
- SPIE Photomask Technology + EUV Lithography 2008
The comparison of OPC performance and run time for dense versus sparse solutions
- Amr Abdo
- Ian Stobert
- et al.
- 2008
- SPIE Advanced Lithography 2008