Growth of SiGe epitaxial quantum dots on patterned Si (001) surfaces by in situ annealing of initially conformal layersJ.M. AmatyaH. Heinrichet al.2018Journal of Applied Physics
Synthesis and functionalization of epitaxial quantum dot nanostructures for nanoelectronic architecturesR. HullJ. Floroet al.2008Materials Science in Semiconductor Processing
Precision placement of heteroepitaxial semiconductor quantum dotsR. HullJ. Grayet al.2003Materials Science and Engineering: B
Stress modification of WSi2.2 films by concurrent low energy ion bombardment during alloy evaporationD.S. YeeJ. Floroet al.1985JVSTA