Model for focused ion beam deposition
- J.P. Levin
- P.G. Blauner
- et al.
- 1990
- Microlithography 1990
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4 results for James P. Levin
Mitigation of extreme ultraviolet mask defects by pattern shifting: Method and statistics
- Alfred Wagner
- Martin Burkhardt
- et al.
- 2012
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
High-accuracy defect-free X-Ray mask technology
- Steven C. Nash
- Thomas B. Faure
- et al.
- 1994
- Japanese Journal of Applied Physics
Focused ion beam repair of lithographic masks
- A. Wagner
- J.P. Levin
- 1989
- Nuclear Inst. and Methods in Physics Research, B