SODEL FET: Novel channel and source/drain profile engineering schemes by selective Si epitaxial growth technology
- Satoshi Inaba
- Kiyotaka Miyano
- et al.
- 2004
- IEEE Transactions on Electron Devices
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.