Two-dimensional mask effects at the 14 nm logic node
- A.E. Zweber
- A.E. McGuire
- et al.
- 2013
- SPIE Photomask Technology 2013
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3 results for Yoshiyuki Negishi
Using pattern shift to avoid blank defects during EUVL mask fabrication
- Yoshiyuki Negishi
- Yuki Fujita
- et al.
- 2013
- Photomask and Next-Generation Lithography Mask Technology 2013
EUV mask line edge roughness
- Amy E. Zweber
- Emily Gallagher
- et al.
- 2012
- SPIE Advanced Lithography 2012