Significance of plasma-photoresist interactions for atomic layer etching processes with extreme ultraviolet photoresist
- Adam Pranda
- Kang Yi Lin
- et al.
- 2020
- JVSTA
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Polymer etching by atmospheric-pressure plasma jet and surface micro-discharge sources: Activation energy analysis and etching directionality
- Andrew J. Knoll
- Pingshan Luan
- et al.
- 2018
- Plasma Processes and Polymers