Significance of plasma-photoresist interactions for atomic layer etching processes with extreme ultraviolet photoresist
- Adam Pranda
- Kang Yi Lin
- et al.
- 2020
- JVSTA
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3 results for Kang Yi Lin
Selective atomic layer etching of HfO2 over silicon by precursor and substrate-dependent selective deposition
- Kang Yi Lin
- Chen Li
- et al.
- 2020
- JVSTA
Achieving ultrahigh etching selectivity of SiO2 over Si3N4 and Si in atomic layer etching by exploiting chemistry of complex hydrofluorocarbon precursors
- Kang Yi Lin
- Chen Li
- et al.
- 2018
- JVSTA