Formation of nanometer-thick delaminated amorphous carbon layer by two-step plasma processing of methacrylate-based polymer
- Dominik Metzler
- Florian Weilnboeck
- et al.
- 2015
- JVSTB
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117 results for Gottlieb S. Oehrlein
Significance of plasma-photoresist interactions for atomic layer etching processes with extreme ultraviolet photoresist
- Adam Pranda
- Kang Yi Lin
- et al.
- 2020
- JVSTA
Selective atomic layer etching of HfO2 over silicon by precursor and substrate-dependent selective deposition
- Kang Yi Lin
- Chen Li
- et al.
- 2020
- JVSTA
The Analysis of Diffusion Data by a Method of Moments
- R. Ghez
- J.D. Fehribach
- et al.
- 2019
- JES
Near-Surface Damage and Contamination after CF4/H2 Reactive Ion Etching of Si
- G.S. Oehrlein
- R.M. Tromp
- et al.
- 2019
- JES
Investigation of Reactive-Ion-Etching-Related Fluorocarbon Film Deposition onto Silicon and a New Method for Surface Residue Removal
- G.S. Oehrlein
- J.G. Clabes
- et al.
- 2019
- JES
Surface Modifications of Electronic Materials Induced by Plasma Etching
- G.S. Oehrlein
- S.W. Robey
- et al.
- 2019
- JES
Hollow Cathode Etching of Si and SiO2 Using CF4 and H2
- G. Fortuño-Wiltshire
- G.S. Oehrlein
- 2019
- JES
Etch Selectivity of Silicon Dioxide over Titanium Silicide Using CF4/H2 Reactive Ion Etching
- Steve W. Robey
- Gottlieb S. Oehrlein
- 2019
- JES
Electrical studies on annealed d2 plasma-exposed silicon
- A. Henry
- O.O. Awadelkarim
- et al.
- 2019
- JES