Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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117 results for Gottlieb S. Oehrlein

Fabrication of Cu interconnects of 50 nm linewidth by electron-beam lithography and high-density plasma etching
- - Y. Hsu
  - T. Standaert
  - et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Fluorocarbon high density plasmas. VII. Investigation of selective SiO₂-to-Si₃N₄ high density plasma etch processes
- - Ying Zhang
  - Gottlieb S. Oehrlein
  - et al.
- 1996
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Fluorocarbon high-density plasmas. II. Silicon dioxide and silicon etching using CF₄ and CHF
- - Y. Zhana
  - D. Vender
  - et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Fluorocarbon high-density plasmas. I. Fluorocarbon film deposition and etching using CF₄ and CHF₃
- - G.S. Oehrlein
  - Y. Zhang
  - et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Depth profiling of the Ge concentration in SiGe alloys using in situ ellipsometry during reactive-ion etching
- - G.M.W. Kroesen
  - G.S. Oehrlein
  - et al.
- 1993
- Journal of Applied Physics
A photoluminescence study of CF₄ reactive-ion-etched silicon: Various process conditions and magnetically enhanced etching
- - A. Henry
  - B. Monemar
  - et al.
- 1993
- Journal of Applied Physics
High-Resolution Depth Profiling of Ultrathin Silicon Oxide/Nitride/Oxide Layers
- - G.M.W. Kroesen
  - G.S. Oehrlein
  - et al.
- 1993
- JES
Reactive Ion Etching of Sige Alloys using Fluorine-Containing Plasmas *
- - James W. Corbett
  - Gottlieb S. Oehrlein
  - et al.
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Selective reactive ion etching of phosphorus-doped oxide over undoped SiO₂
- - David Vender
  - Gottlieb S. Oehrlein
  - et al.
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Effects of ion bombardment in plasma etching on the fluorinated silicon surface layer: Real-time and postplasma surface studies
- - Gottlieb S. Oehrlein
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films