Fabrication of Cu interconnects of 50 nm linewidth by electron-beam lithography and high-density plasma etching
- Y. Hsu
- T. Standaert
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
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117 results for Gottlieb S. Oehrlein
Fluorocarbon high density plasmas. VII. Investigation of selective SiO2-to-Si3N4 high density plasma etch processes
- Ying Zhang
- Gottlieb S. Oehrlein
- et al.
- 1996
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Fluorocarbon high-density plasmas. II. Silicon dioxide and silicon etching using CF4 and CHF
- Y. Zhana
- D. Vender
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Fluorocarbon high-density plasmas. I. Fluorocarbon film deposition and etching using CF4 and CHF3
- G.S. Oehrlein
- Y. Zhang
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Depth profiling of the Ge concentration in SiGe alloys using in situ ellipsometry during reactive-ion etching
- G.M.W. Kroesen
- G.S. Oehrlein
- et al.
- 1993
- Journal of Applied Physics
A photoluminescence study of CF4 reactive-ion-etched silicon: Various process conditions and magnetically enhanced etching
- A. Henry
- B. Monemar
- et al.
- 1993
- Journal of Applied Physics
High-Resolution Depth Profiling of Ultrathin Silicon Oxide/Nitride/Oxide Layers
- G.M.W. Kroesen
- G.S. Oehrlein
- et al.
- 1993
- JES
Reactive Ion Etching of Sige Alloys using Fluorine-Containing Plasmas *
- James W. Corbett
- Gottlieb S. Oehrlein
- et al.
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Selective reactive ion etching of phosphorus-doped oxide over undoped SiO2
- David Vender
- Gottlieb S. Oehrlein
- et al.
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Effects of ion bombardment in plasma etching on the fluorinated silicon surface layer: Real-time and postplasma surface studies
- Gottlieb S. Oehrlein
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films