Effects of deuterium plasma treatments on the electrical properties of boron-doped silicon
- A. Henry
- O.O. Awadelkarim
- et al.
- 1989
- Materials Science and Engineering B
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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117 results for Gottlieb S. Oehrlein
Dry etching damage of silicon: A review
- Gottlieb S. Oehrlein
- 1989
- Materials Science and Engineering B
In situ spatially resolved surface characterization of realistic semiconductor structure after reactive ion etching process
- Gottlieb S. Oehrlein
- Kevin K. Chan
- et al.
- 1988
- Journal of Applied Physics
Surface processes in CF4/O2 reactive etching of silicon
- Gottlieb S. Oehrlein
- Steve W. Robey
- et al.
- 1988
- Applied Physics Letters
Efficiency of oxygen plasma cleaning of reactive ion damaged silicon surfaces
- Gottlieb S. Oehrlein
- Gerald J. Scilla
- et al.
- 1988
- Applied Physics Letters
Capacitance-voltage properties of thin Ta2O5 films on silicon
- Gottlieb S. Oehrlein
- 1988
- Thin Solid Films
Medium energy ion scattering analysis of reactive ion etched Si(001) surfaces
- M. Copel
- R.M. Tromp
- et al.
- 1988
- Applied Physics Letters
Valence-band photoemission and electron energy-loss studies of reactive ion etched silicon dioxide
- S.W. Robey
- G.S. Oehrlein
- 1988
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Hydrogen plasma induced defects in silicon
- S.-J. Jeng
- G.S. Oehrlein
- et al.
- 1988
- Applied Physics Letters
X-ray photoemission spectroscopy characterization of silicon surfaces after CF4/H2magnetron ion etching: Comparisons to reactive ion etching
- Gottlieb S. Oehrlein
- Arthur A. Bright
- et al.
- 1988
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films