A manufacturable dual channel (Si and SiGe) high-k metal gate CMOS technology with multiple oxides for high performance and low power applicationsS. KrishnanU. Kwonet al.2011IEDM 2011
Gate length scaling and high drive currents enabled for high performance SOI technology using high-κ/metal gateK. HensonH. Buet al.2008IEDM 2008
A high performance 90 nm SOI technology with 0.992 μm2 6T-SRAM cellMukesh KhareS. Kuet al.2002IEDM 2002
Novel high-performance analog devices for advanced low-power high-k metal gate complementary metal-oxide-semiconductor technologyJin-Ping HanTakashi Shimizuet al.2011Japanese Journal of Applied Physics