Himpsel et al. reply [2]
- F.J. Himpsel
- U.O. Karlsson
- et al.
- 1988
- Physical Review Letters
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30 results for Jory A. Yarmoff
Interaction of hexafluoroazomethane with Si(111)
- F.R. McFeely
- J.A. Yarmoff
- et al.
- 1988
- The Journal of Chemical Physics
Dielectrics on semiconductors
- F.J. Himpsel
- U.O. Karlsson
- et al.
- 1988
- Materials Science and Engineering B
Oxygen removal from Si via reaction with adsorbed Ge
- J.F. Morar
- B.S. Meyerson
- et al.
- 1987
- Applied Physics Letters
MODEL SYSTEMS IN THE STUDY OF ETCHING MECHANISMS.
- F.R. McFeely
- J.F. Morar
- et al.
- 1986
- Symposium on Plasma Processing 1986
Valence electronic structure of Y1Ba2Cu3O7
- J.A. Yarmoff
- D.R. Clarke
- et al.
- 1987
- Physical Review B
Mechanism of ion-assisted etching of silicon by fluorine atoms
- J.A. Yarmoff
- F.R. McFeely
- 1987
- Surface Science
Electronic structure of the CaF2/Si(111) interface
- D. Rieger
- F.J. Himpsel
- et al.
- 1986
- Physical Review B
Formation of a new ordered structure of CaF2/Si(111) by ultraviolet irradiation
- U.O. Karlsson
- F.J. Himpsel
- et al.
- 1986
- Physical Review Letters
Determination of interface states for CaF2/Si(111) from near-edge x-ray-absorption measurements
- F.J. Himpsel
- U.O. Karlsson
- et al.
- 1986
- Physical Review Letters