Critical dimension scanning electron microscope local overlay measurement and its application for double patterning of complex shapes
- Shoji Hotta
- Takumichi Sutani
- et al.
- 2011
- J. Micro/Nanolithogr. MEMS MOEMS
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Spatial signature in local overlay measurements - "what CD-SEM can tell us and optical measurements can not"
- Scott Halle
- Daniel Moore
- et al.
- 2010
- SPIE Advanced Lithography 2010