Development of SiGe Indentation Process Control to Enable Stacked Nanosheet FET Technology
- Dexin Kong
- Daniel Schmidt
- et al.
- 2020
- ASMC 2020
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3 results for Daniel Schmidt
Line top loss and line top roughness characterizations of EUV resists
- Daniel Schmidt
- Karen Petrillo
- et al.
- 2020
- SPIE Advanced Lithography 2020
AFM characterization for Gate-All-Around (GAA) devices
- Mary Breton
- Jennifer Fullam
- et al.
- 2020
- SPIE Advanced Lithography 2020