Influence of alloying elements on the formation and stability of NiSi
- C. Detavernier
- D. Deduytsche
- et al.
- 2006
- ECS Meeting 2006
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9 results for D. Deduytsche
In situ X-ray diffraction study of thin film Ir/Si solid state reactions
- W. Knaepen
- J. Demeulemeester
- et al.
- 2010
- Microelectronic Engineering
Simultaneous real-time x-ray diffraction spectroscopy, Rutherford backscattering spectrometry, and sheet resistance measurements to study thin film growth kinetics by Kissinger plots
- D. Smeets
- J. Demeulemeester
- et al.
- 2008
- Journal of Applied Physics
Formation and stability of NiSi in the presence of Co and Fe alloying elements
- D. Deduytsche
- C. Detavernier
- et al.
- 2008
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Nucleation and diffusion during growth of ternary Co1-x Nix Si2 thin films studied by complementary techniques in real time
- D. Smeets
- J. Demeulemeester
- et al.
- 2008
- Journal of Applied Physics
Effect of Pt addition on growth stress and thermal stress of NiSi films
- C. Van Bockstael
- K. De Keyser
- et al.
- 2008
- Journal of Applied Physics
Formation and morphological stability of NiSi in the presence of W, Ti, and Ta alloying elements
- D. Deduytsche
- C. Detavernier
- et al.
- 2007
- Journal of Applied Physics
Influence of Ge substrate crystallinity on Co germanide formation in solid-state reactions
- K. Opsomer
- D. Deduytsche
- et al.
- 2007
- Applied Physics Letters
High-temperature degradation of NiSi films: Agglomeration versus NiSi 2 nucleation
- D. Deduytsche
- C. Detavernier
- et al.
- 2005
- Journal of Applied Physics