Use of a quartz crystal microbalance rate monitor to examinfthotofroduct effects on resistthssolution
- W.D. Hinsberg
- C.G. Willson
- et al.
- 1989
- Proceedings of SPIE 1989
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104 results for C. Grant Willson
Resist materials
- Scott A. MacDonald
- Jean M.J. Frechet
- et al.
- 1985
- Microelectronic Engineering
PHOTOINITIATED INTERFACIAL CATIONIC POLYMERIZATION.
- C.G. Willson
- Anders Hult
- et al.
- 1984
- ACS National Meeting 1984
APPLICATIONS OF PHOTOINITIATORS TO THE DESIGN OF RESISTS FOR SEMICONDUCTOR MANUFACTURING.
- Hiroshi Ito
- Grant Willson
- 1983
- ACS National Meeting 1983
SEMIEMPIRICAL CALCULATIONS OF ELECTRONIC SPECTRA: USE IN THE DESIGN OF MID-UV SENSITIZERS.
- R.D. Miller
- D.R. McKean
- et al.
- 1983
- ACS National Meeting 1983
Polysilane Bilayer UV Lithography
- Donald C. Hofer
- Robert D. Miller
- et al.
- 1989
- Proceedings of SPIE 1989
Poly(p-tert-butoxycarbonyloxystyrene): a convenient precursor to p-hydroxystyrene resins
- Jean M.J. Fréchet
- Eva Eichler
- et al.
- 1983
- Polymer
Advances in the design of organic resist materials
- Scott A. MacDonald
- Hiroshi Ito
- et al.
- 1983
- Microelectronic Engineering
Characterization of the induction effect at mid-ultraviolet exposure: Application to AZ2400 at 313 nm
- Donald C. Hofer
- Grant Willson
- et al.
- 1989
- Proceedings of SPIE 1989
Ultrafast high resolution contact lithography using excimer lasers
- K. Jain
- B.J. Lin
- 1989
- Proceedings of SPIE 1989