Nonlinear Optical Epoxy Polymers with Polar Tolan Chromophores
- R.J. Twieg
- M. Ebert
- et al.
- 1992
- Molecular Crystals and Liquid Crystals Science and Technology. Section A. Molecular Crystals and Liquid Crystals
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104 results for C. Grant Willson
Alkylated poly(4-hydroxystyrene) derivatives for deep ultraviolet lithography
- D.R. McKean
- W.D. Hinsberg
- et al.
- 1992
- J. Photopolym. Sci. Tech.
Novel chemically amplified dry-developing imaging materials for high resolution microlithography
- J.M.J. Frchet
- J. Fahey
- et al.
- 1992
- J. Photopolym. Sci. Tech.
Stability of nonlinear optical characteristics and dielectric relaxations of poled amorphous polymers with main-chain chromophores
- I. Teraoka
- D. Jungbauer
- et al.
- 1991
- Journal of Applied Physics
Second-order nonlinear optical properties and relaxation characteristics of poled linear epoxy polymers with tolane chromophores
- D. Jungbauer
- I. Teraoka
- et al.
- 1991
- Journal of Applied Physics
Top-surface-imaging resist for deep UV lithography
- Scott A. MacDonald
- H. Schlosser
- et al.
- 1991
- International Technical Conference on Photopolymers 1991
Polymeric nonlinear optoelectronic materials, challenges and opportunities
- R. Tweig
- G.C. Bjorklund
- et al.
- 1991
- ACS Spring 1991
Advances in organic resist materials
- C.G. Willson
- 1991
- ACS Spring 1991
Airborne chemical contamination of a chemically amplified resist
- Scott A. MacDonald
- N.J. Clecak
- et al.
- 1991
- Microlithography 1991
Highly efficient and stable nonlinear optical polymers via chemical cross-linking under electric field
- D. Jungbauer
- B. Reck
- et al.
- 1990
- Applied Physics Letters