X-ray topographic determination of the absence of lateral strains in ion-implanted siliconK.N. TuP. Chaudhariet al.2003Journal of Applied Physics
Elastic and anelastic behavior of ion-implanted siliconS.I. TanB.S. Berryet al.2003Applied Physics Letters
Circular etch pits in ion-implanted amorphous silicon filmsK.N. TuS.I. Tanet al.2003Applied Physics Letters