Advanced in-line metrology strategy for self-aligned quadruple patterning
- Robin Chao
- Mary Breton
- et al.
- 2016
- SPIE Advanced Lithography 2016
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15 results for Aron Cepler
Scatterometry-based defect detection for DSA in-line process control
- Robin Chao
- Chi Chun Liu
- et al.
- 2015
- SPIE Advanced Lithography 2015
Spectral interferometry for fully integrated device metrology
- Daniel Schmidt
- Manasa Medikonda
- et al.
- 2023
- JM3
Development of SiGe Indentation Process Control for Gate-All-Around FET Technology Enablement
- Daniel Schmidt
- Aron Cepler
- et al.
- 2022
- IEEE Trans Semicond Manuf
In-line Raman spectroscopy for gate-all-around nanosheet device manufacturing
- Daniel Schmidt
- Curtis Durfee
- et al.
- 2022
- JM3