Fully scaled 0.5 μm MOS cicuits by synchroton X-ray lithography: Resist systems and line width control
- David Seeger
- K.T. Kwietniak
- et al.
- 1989
- Microelectronic Engineering
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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14 results for J.M. Warlaumont
Fully scaled 0.5μm MOS circuits by synchrotron radiation X-ray lithography: Mask fabrication and chraterization
- R. Viswanathan
- R.E. Acosta
- et al.
- 1989
- Microelectronic Engineering
X-ray lithography and storage rings
- John Warlaumont
- 1986
- Nuclear Inst. and Methods in Physics Research, A
Synchrotrom radiation X-ray lithography
- R.P. Haelbich
- J. Silverman
- et al.
- 1984
- Nuclear Instruments and Methods In Physics Research