Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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5 results for J. Keller

New precision technique for measuring the concentration versus depth of hydrogen in solids
- - W.A. Lanford
  - H.P. Trautvetter
  - et al.
- 2008
- Applied Physics Letters
Plasma-etching processes for ULSI semiconductor circuits
- - M. Armacost
  - P.D. Hoh
  - et al.
- 1999
- IBM J. Res. Dev
A study of CClF₃/H₂ reactive ion etching damage and contamination effects in silicon
- - X.C. Mu
  - S.J. Fonash
  - et al.
- 1986
- Journal of Applied Physics
Plasma potentials of 13.56-MHz rf argon glow discharges in a planar system
- - K. Köhler
  - J.W. Coburn
  - et al.
- 1985
- Journal of Applied Physics
Summary Abstract: Plasma potentials of 13.56 MHz rf argon glow discharges in a planar system
- - K. Kehler
  - J.W. Coburn
  - et al.
- 1985
- JVSTA