Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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357 results at Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Schiff base precursor compounds for the chemical beam epitaxy of oxide thin films. I. Deposition of CuO on MgO[001] using copper (II) bis(benzoylacetone)-ethylendiimine
- - E. Fritsch
  - E. Mächler
  - et al.
- 1996
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Development of 111 texture in Al films grown on SiO₂/Si(001) by ultrahigh-vacuum primary-ion deposition
- - Y.W. Kim
  - I. Petrov
  - et al.
- 1996
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Effects of surface oxide on the rapid thermal nitridation of Si(001)
- - M. Copel
  - R.M. Tromp
  - et al.
- 1996
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Effect of a surface layer on the stress relaxation of thin films
- - M.D. Thouless
  - K.P. Rodbell
  - et al.
- 1996
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Study of buried interfaces by soft x-ray fluorescence spectroscopy excited by synchrotron radiation
- - D.L. Ederer
  - J.A. Carlisle
  - et al.
- 1996
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Fluorocarbon high density plasmas. VII. Investigation of selective SiO₂-to-Si₃N₄ high density plasma etch processes
- - Ying Zhang
  - Gottlieb S. Oehrlein
  - et al.
- 1996
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Using scanning tunneling microscopy to underst and diffraction oscillations: Fe growth on Cu(100)
- - Kevin E. Johnson
- 1995
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Plasma enhanced chemical vapor deposition of TiO₂ in microwave-radio frequency hybrid plasma reactor
- - Young H. Lee
  - Kevin K. Chan
  - et al.
- 1995
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Mass spectrometric studies of remote helium plasma dissociation of silane
- - Joseph M. Jasinski
- 1995
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Compositional and Electrical Properties of Si Metal-Oxide-Semiconductor Structure Prepared by Direct Photoenhanced Chemical Vapor Deposition using a Deuterium Lamp
- - E. Machler
  - E.J. Williams
  - et al.
- 1995
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films