Massively-parallel FDTD simulations to address mask electromagnetic effects in Hyper-NA immersion lithography
- Jaione Tirapu Azpiroz
- Geoffrey W. Burr
- et al.
- 2008
- SPIE Advanced Lithography 2008
Publications
3560 results for Mathematical Sciences
Measuring layer-specific depth-of-focus requirements
- Bernhard Liegl
- Allen Gabor
- et al.
- 2008
- SPIE Advanced Lithography 2008
Monitoring polarization at 193nm high-numerical aperture with phase shift masks: Experimental results and industrial outlook
- Gregory McIntyre
- Richard Tu
- 2008
- SPIE Advanced Lithography 2008
The comparison of OPC performance and run time for dense versus sparse solutions
- Amr Abdo
- Ian Stobert
- et al.
- 2008
- SPIE Advanced Lithography 2008
Radiometric consistency in source specifications for lithography
- Alan E. Rosenbluth
- Jaione Tirapu Azpiroz
- et al.
- 2008
- SPIE Advanced Lithography 2008
32 NM Logic patterning options with immersion lithography
- K. Lai
- S. Burns
- et al.
- 2008
- SPIE Advanced Lithography 2008
Location dependent heuristics for sensor coverage planning
- 2008
- Defense Transformation and Net-Centric System 2008
Integration of optical I/O with organic chip packages
- Bert J. Offrein
- Christoph Bergen
- et al.
- 2008
- SPIE Photonics Europe 2008
A biologically-inspired MANET architecture
- Aaron Kershenbaum
- Vasilieos Pappas
- et al.
- 2008
- Defense Transformation and Net-Centric System 2008
Extension of depth of field in integral imaging using amplitude and phase modulation of the pupil function
- Saeed Bagheri
- Bahram Javidi
- 2008
- SPIE Defense + Security 2008