Rapid, accurate improvement in 3D mask representation via input geometry optimization and crosstalk
- David Fryer
- Michael Lam
- et al.
- 2014
- SPIE Advanced Lithography 2014
Publications
9084 results for Computer Science
E-beam inspection of EUV mask defects: To etch or not to etch?
- Ravi Bonam
- Hung-Yu Tien
- et al.
- 2014
- SPIE Advanced Lithography 2014
CDSEM AFM hybrid metrology for the characterization of gate-all-around silicon nano wires
- Shimon Levi
- Ishai Schwarzband
- et al.
- 2014
- SPIE Advanced Lithography 2014
Short-term forecasting of cloud images using local features
- Wenhui Jiang
- Fei Su
- et al.
- 2013
- ICGIP 2013
Molecular glass resists for scanning probe lithography
- Christian Neuber
- Andreas Ringk
- et al.
- 2014
- SPIE Advanced Lithography 2014
Novel in-line metrology methods for Fin pitch walking monitoring in 14nm node and beyond
- Robin Chao
- Kriti Kohli
- et al.
- 2014
- SPIE Advanced Lithography 2014
Estimating pattern sensitivity to the printing process for varying dose/focus conditions for RET development in the sub-22nm era
- Benoit Seguin
- Henri Saab
- et al.
- 2014
- SPIE Advanced Lithography 2014
Closed-loop high-speed 3D thermal probe nanolithography
- Armin W. Knoll
- Michal Zientek
- et al.
- 2014
- SPIE Advanced Lithography 2014
Spin-on organic hardmask for topo-patterned substrate
- Kazuhiko Komura
- Yoshi Hishiro
- et al.
- 2014
- SPIE Advanced Lithography 2014
ICE: Ionic contrast enhancement for organic solvent negative tone develop
- Linda K. Sundberg
- Gregory M. Wallraff
- et al.
- 2014
- SPIE Advanced Lithography 2014