Microstructure control in semiconductor metallization
- J.M.E. Harper
- K.P. Rodbell
- 1997
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
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168 results at Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Energy distributions of field emitted electrons from carbide tips and-tuncisten tips with dismondlike carbon coatinas
- Ming L. Yu
- Ho-Seob Kim
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Predicting in-plane distortion from electron-beam lithography on x-ray mask membranes
- D.L. Laird
- R. Engelstad
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Energy spread in liquid metal ion sources at low currents
- J.C. Beckman
- T.H.P. Chang
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
High resolution electron beam lithography using ZEP-520 and KRS resists at low voltage
- D.M. Tanenbaum
- C.W. Lo
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Stressing and high field transport studies on device-grade SiO2 by ballistic electron emission spectroscopy
- R. Ludeke
- H.J. Wen
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Study of interface abruptness of molecular beam epitaxial GaAs/AlAs superlattices grown on GaAs (311) and (100) substrates
- Y. Hsu
- W.I. Wang
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Scanning force microscopy in the dynamic mode using microfabricated capacitive sensors
- N. Blanc
- J. Brugger
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Image placement errors in x-ray masks induced by changes in resist stress during electron-beam writing
- R.E. Acosta
- Denise Puisto
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Ionized physical vapor deposition of Cu for high aspect ratio damascene trench fill applications
- C. Nichols
- S.M. Rossnagel
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures