Effect of Composition Uniformity in the Polymer Chain of EUV Photoresist on Lithographic Performance
- EuiJin Ko
- YooRim Jang
- et al.
- 2025
- SPIE Advanced Lithography 2025
Publications
14443 results for Physical Sciences
Consideration on segregation behavior of the surface localization material and the pattern roughness degradation in EUV lithography
- KwangMo Choi
- YunJi Kim
- et al.
- 2025
- SPIE Advanced Lithography 2025
New Photoacid Generators Designed for Advanced EUV Patterning
- Kamal P. Pandey
- Emad Aqad
- et al.
- 2025
- SPIE Advanced Lithography 2025
The Impact of Polymer Compositional Homogeneity on Lithography and Defects
- Benjamin D. Rafael-Naab
- Jong Keun Park
- et al.
- 2025
- SPIE Advanced Lithography 2025
New Molecular Resist Design for Advanced Patterning
- Vageesha Liyana Gunawardana
- Emad Aqad
- et al.
- 2025
- SPIE Advanced Lithography 2025
A Route toward the On-Surface Synthesis of Organic Ferromagnetic Quantum Spin Chains
- Fabian Paschke
- Ricardo Ortiz
- et al.
- 2025
- JACS
Revealing the Origin and Nature of the Buried Metal-Substrate Interface Layer in Ta/Sapphire Superconducting Films
- Aswin k. Anbalagan
- Rebecca Cummings
- et al.
- 2025
- Advanced Science
Emerging Materials and Computing Paradigms for Temporal Signal Analysis
- Teng Zhang
- Stanislaw Wozniak
- et al.
- 2025
- Advanced Materials
Inhibitor-Free Area-Selective Deposition of Titanium Nitride
- Damon B. Farmer
- Marinus Hopstaken
- et al.
- 2025
- Chemistry of Materials
Investigation of the effect of oxygen partial pressure during reactive sputtering of tantalum oxide resistive random access memory switching layer
- Rajas Mathkari
- Maximilian Liehr
- et al.
- 2025
- Materials Science in Semiconductor Processing