The influence of substrate topography on ion bombardment in plasma etching
- S.G. Ingram
- 1990
- Journal of Applied Physics
Publications
2360 results at Journal of Applied Physics
Media noise in periodic multilayered magnetic films with perpendicular anisotropy
- I.L. Sanders
- D.R. Wilhoit
- et al.
- 1990
- Journal of Applied Physics
Spatially resolved measurement technique of magnetic anisotropy fields using the magneto-optic Kerr effect
- C.S. Gudeman
- D. Mauri
- 1990
- Journal of Applied Physics
Interdiffusion and resistivity of Cu/Au, Cu/Co, Co/Au, and Cu/Co/Au thin films at 25-550°C
- Peter Madakson
- Joyce C. Liu
- 1990
- Journal of Applied Physics
Reactive-ion- and plasma-etching-induced extended defects in silicon studied with photoluminescence
- H. Weman
- J.L. Lindström
- et al.
- 1990
- Journal of Applied Physics
The effect of Cr underlayer thickness on magnetic and structural properties of CoPtCr thin films
- K. Johnson
- P. Ivett
- et al.
- 1990
- Journal of Applied Physics
Magnetoreflectivity study of excitons in ZnCoSe
- X. Liu
- A. Petrou
- et al.
- 1990
- Journal of Applied Physics
Magnetic and magneto-optic properties of Bi-substituted garnet films crystallized by rapid thermal processing
- Takao Suzuki
- Federico Sequeda
- et al.
- 1990
- Journal of Applied Physics
Chemical sputtering of Al2O3 by fluorine-containing plasmas excited by electron cyclotron resonance
- Y.H. Lee
- Z.H. Zhou
- et al.
- 1990
- Journal of Applied Physics
As+ and Ga+ implantation and the formation of buried GaAs layers in silicon
- Peter Madakson
- Eti Ganin
- et al.
- 1990
- Journal of Applied Physics