Electrical studies on annealed d2 plasma-exposed silicon
- A. Henry
- O.O. Awadelkarim
- et al.
- 2019
- JES
Publications
509 results at JES
The Mechanism of Electroless Cu Deposition: Extraction of the Oxidative and Reductive Electrochemical Half-Cell Currents from a Complete Bath
- O.R. Melroy
- 2019
- JES
The Effects of Pressure, Temperature, and Time on the Annealing of lonizing Radiation Induced Insulator Damage in N-channel IGFET's
- A. Reisman
- C.J. Merz
- 2019
- JES
Electrochemistry of Chromium-Metalloid Alloys in Sulfuric Acid—II
- R.R. Ruf
- 2019
- JES
Dopant Diffusion in Self-Aligned Silicide/Silicon Structures
- Marc Wittmer
- 2019
- JES
MnFe and NiFe Thin Films and Magnetic Exchange Bilayers
- Michael A. Russak
- S.M. Rossnagel
- et al.
- 2019
- JES
Copper Corrosion with and without Inhibitors
- V. Brusic
- M.A. Frisch
- et al.
- 2019
- JES
Migration Considerations in Chronopotentiometric Analysis
- Huk Y. Cheh
- 2019
- JES
A Study of Luminescent Centers in Reactive-Ion-Etched Silicon
- T.D. Bestwick
- G.S. Oehrlein
- et al.
- 2019
- JES
Reactive ion Etching of Silicon and Silicon Dioxide in CF4 Plasmas Containing H2 or C2F4 Additives
- J.P. Simko
- 2019
- JES