Summary Abstract: Developments in broad-beam ion source technology and applications
- H.R. Kaufman
- J.J. Cuomo
- 1983
- JVSTA
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176 results at JVSTA
Schottky barrier formation at Pd, Pt, and Ni/Si(111) interfaces
- R.J. Purtell
- G. Hollinger
- et al.
- 1983
- JVSTA
Plasma etching of niobium with CF4/O2 gases
- Mao-Min Chen
- Run Han Wang
- 1983
- JVSTA
Summary Abstract: Cluster formation and the percolation threshold in thin Au films
- R.B. Laibowitz
- E.I. Alessandrini
- et al.
- 1983
- JVSTA
Importance of chain reactions in the plasma deposition of hydrogenated amorphous silicon
- Ivan Haller
- 1983
- JVSTA
Oxygen chemisorption and oxide formation on Si(111) and Si(100) surfaces
- G. Hollinger
- F.J. Himpsel
- 1983
- JVSTA
Test of structural models for Ag{110}1 2-0 by LEED intensity analysis
- E. Zanazzi
- M. Maglietta
- et al.
- 1983
- JVSTA
Chemical bonding and reactions at Ti/Si and Ti/oxygen/Si interfaces
- R. Blitz
- G.W. Rubloff
- et al.
- 1983
- JVSTA
Vacuum systems for microelectronics
- John F. O’hanlon
- 1983
- JVSTA
Patterning of poly-para-xylylenes by reactive ion etching
- J.T.C. Yeh
- K.R. Grebe
- 1983
- JVSTA