Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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357 results at Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Kinetics of physical adsorption of ethane on lr(110)-(1 × 2): Molecular beam reflectivity measurements and Monte Carlo simulations
- - W.H. Weinberg
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
A study of modified polyimide surfaces as related to adhesion
- - D-Y. Shih
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Molecular beam studies of trapping dynamics
- - W.H. Weinberg
  - C.B. Mullins
  - et al.
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Lateral dopant profiling on a 100 nm scale by scanning capacitance microscopy
- - C.C. Williams
  - J. Slinkman
  - et al.
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Atomic structure of alkali metal overlayers on the Si(001) surface
- - Inder P. Batra
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Equilibrium surface hydrogen coverage during silicon epitaxy using SiH₄
- - C.M. Greenlief
  - M. Offenberg
  - et al.
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
X-ray photoelectron spectroscopy and ellipsometry studies of the electrochemically controlled adsorption of benzotriazole on copper surfaces
- - S.L. Cohen
  - V. Brusic
  - et al.
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Microstructure of yttria-stabilized zirconia overcoats for thin film recording media
- - C. Hwang
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
High rate radio frequency sputtering using in-phase plasma confinement
- - James E. Lucy
  - John Costable
  - et al.
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Molecular-beam study of gas-surface chemistry in the ion assisted etching of silicon with atomic and molecular hydrogen and chlorine
- - J.W. Coburn
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films