Fluorocarbon high-density plasmas. II. Silicon dioxide and silicon etching using CF4 and CHF
- Y. Zhana
- D. Vender
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Publications
3512 results for Materials Discovery
Fluorocarbon high density plasma. VI. Reactive ion etching lag model for contact hole silicon dioxide etching in an electron cyclotron resonance plasma
- M. Surendra
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Simulation of surface topography evolution during plasma etching by the method of characteristics
- Manoj Dalvie
- Satoshi Hamaguchi
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Deposition of aluminum oxide films with high refractive index
- K.K. Shih
- D.B. Dove
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
The micro-wear technique and its application to ultrathin film systems
- T.W. Wu
- Chih-Kung Lee
- 1994
- Journal of Materials Research
π‐Electron delocalization in conformationally distorted oligopyrroles and ploypyrrole
- Giuseppe Zerbi
- Maurizio Veronelli
- et al.
- 1994
- Advanced Materials
Ultrasensitive optical spectroscopy of rare earth solids
- M.L Jones
- S.M Jaffe
- et al.
- 1994
- Journal of Alloys and Compounds
Micro-impact technique and its applications
- T.W. Wu
- Chih-Kung Lee
- 1994
- Journal of Materials Research
A Surface Acoustic Wave Sensor Study of Polyimide Thin Film Surface Treatments — Effect on Water Uptake
- D.W. Galipeau
- P.R. Story
- et al.
- 1994
- Journal of Adhesion Science and Technology
Frontiers in computational materials science
- Sokrates T. Pantelides
- 1994
- Computational Materials Science