Reactive ion etching of 193-nm resist candidates: Current platforms and future requirements
- Thomas I. Wallow
- Phillip J. Brock
- et al.
- 1998
- Microlithography 1998
Publications
3561 results for Mathematical Sciences
Automatic visible watermarking of images
- A. Ravishankar Rao
- Gordon W. Braudaway
- et al.
- 1998
- SPIE Photonics West 1998
Optical lens specifications from the user's perspective
- Christopher J. Progler
- Donald C. Wheeler
- 1998
- SPIE Advanced Lithography 1998
New approaches to production-worthy 193-nm photoresists based on acrylic copolymers
- Thomas I. Wallow
- Robert D. Allen
- et al.
- 1998
- Microlithography 1998
Applying statistical process control to the adaptive rate control problem
- Nelson R. Manohar
- Marc Willebeek-LeMair
- et al.
- 1998
- SPIE Photonics West 1998
Classification, simplification and dynamic visualization of scene transition graphs for video browsing
- Boon-Lock Yeo
- Minerva M. Yeung
- 1998
- SPIE Photonics West 1998
Lithographic characteristics of 193-nm resists imaged at 193 and 248 nm
- Juliann Opitz
- Robert D. Allen
- et al.
- 1998
- Microlithography 1998
Positive bilayer resists for 248- and 193-nm lithography
- Ratnam Sooriyakumaran
- Gregory M. Wallraff
- et al.
- 1998
- Microlithography 1998
Influence of charge carrier injection on the device performance of blue organic light-emitting diodes
- Heike Riel
- Horst Vestweber
- et al.
- 1998
- Proceedings of SPIE 1998
Diagnosis and characterization of timing-related defects by time-dependent light emission
- D.R. Knebel
- P.N. Sanda
- et al.
- 1998
- IEEE ITC 1998