Kinetic model for the chemical vapor deposition of tungsten in the silane reduction process
- Julian J. Hsieh
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Publications
3512 results for Materials Discovery
Effects of substrate bias frequency in an electron cyclotron resonance plasma reactor
- W.M. Holber
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Precursor mediated adsorption of organometallic molecules on GaAs
- Ryutaro Souda
- Ming L. Yu
- 1993
- Surface Science
Effects of ion bombardment in plasma etching on the fluorinated silicon surface layer: Real-time and postplasma surface studies
- Gottlieb S. Oehrlein
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Wear mechanisms of amorphous carbon and zirconia coatings on rigid disk magnetic recording media
- M.T. Dugger
- Y.W. Chung
- et al.
- 1993
- Tribology Transactions
Reactive Ion Etching of Sige Alloys using Fluorine-Containing Plasmas *
- James W. Corbett
- Gottlieb S. Oehrlein
- et al.
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Tantalum and chromium adhesion to polyimide. Part 1. BPDA-PDA surface imidization and modification
- L.P. Buchwalter
- Ravi F. Saraf
- 1993
- Journal of Adhesion Science and Technology
New fluid model for the turbulent transport due to the ion temperature gradient
- Chang-Bae Kim
- Wendell Horton
- et al.
- 1993
- Physics of Fluids B
Stress development and relaxation in copper films during thermal cycling
- M.D. Thouless
- J. Gupta
- et al.
- 1993
- Journal of Materials Research
Contactless electromodulation for in situ characterization of semiconductor processing
- X. Yin
- X. Guo
- et al.
- 1993
- Applied Surface Science