Device-oriented directed self-assembly of lamella microdomains from a block copolymer containing hybrid
- Ho-Cheol Kim
- Joy Cheng
- et al.
- 2008
- SPIE Advanced Lithography 2008
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19 results at SPIE Advanced Lithography 2008
Massively-parallel FDTD simulations to address mask electromagnetic effects in Hyper-NA immersion lithography
- Jaione Tirapu Azpiroz
- Geoffrey W. Burr
- et al.
- 2008
- SPIE Advanced Lithography 2008
32 NM Logic patterning options with immersion lithography
- K. Lai
- S. Burns
- et al.
- 2008
- SPIE Advanced Lithography 2008
Measuring layer-specific depth-of-focus requirements
- Bernhard Liegl
- Allen Gabor
- et al.
- 2008
- SPIE Advanced Lithography 2008
Monitoring polarization at 193nm high-numerical aperture with phase shift masks: Experimental results and industrial outlook
- Gregory McIntyre
- Richard Tu
- 2008
- SPIE Advanced Lithography 2008
The comparison of OPC performance and run time for dense versus sparse solutions
- Amr Abdo
- Ian Stobert
- et al.
- 2008
- SPIE Advanced Lithography 2008
Radiometric consistency in source specifications for lithography
- Alan E. Rosenbluth
- Jaione Tirapu Azpiroz
- et al.
- 2008
- SPIE Advanced Lithography 2008
Cell-based OPC with standard-cell fill insertion
- Liang Deng
- Kai-Yuan Chao
- et al.
- 2008
- SPIE Advanced Lithography 2008
Predicting yield using model based OPC verification - Calibrated with electrical test data
- James A. Bruce
- Tso-Hui Ting
- 2008
- SPIE Advanced Lithography 2008