Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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19 results at SPIE Advanced Lithography 2008

Device-oriented directed self-assembly of lamella microdomains from a block copolymer containing hybrid
- - Ho-Cheol Kim
  - Joy Cheng
  - et al.
- 2008
- SPIE Advanced Lithography 2008
Massively-parallel FDTD simulations to address mask electromagnetic effects in Hyper-NA immersion lithography
- - Jaione Tirapu Azpiroz
  - Geoffrey W. Burr
  - et al.
- 2008
- SPIE Advanced Lithography 2008
32 NM Logic patterning options with immersion lithography
- - K. Lai
  - S. Burns
  - et al.
- 2008
- SPIE Advanced Lithography 2008
Measuring layer-specific depth-of-focus requirements
- - Bernhard Liegl
  - Allen Gabor
  - et al.
- 2008
- SPIE Advanced Lithography 2008
Monitoring polarization at 193nm high-numerical aperture with phase shift masks: Experimental results and industrial outlook
- - Gregory McIntyre
  - Richard Tu
- 2008
- SPIE Advanced Lithography 2008
The comparison of OPC performance and run time for dense versus sparse solutions
- - Amr Abdo
  - Ian Stobert
  - et al.
- 2008
- SPIE Advanced Lithography 2008
Radiometric consistency in source specifications for lithography
- - Alan E. Rosenbluth
  - Jaione Tirapu Azpiroz
  - et al.
- 2008
- SPIE Advanced Lithography 2008
Cell-based OPC with standard-cell fill insertion
- - Liang Deng
  - Kai-Yuan Chao
  - et al.
- 2008
- SPIE Advanced Lithography 2008
Predicting yield using model based OPC verification - Calibrated with electrical test data
- - James A. Bruce
  - Tso-Hui Ting
- 2008
- SPIE Advanced Lithography 2008