170 nm gates fabricated by phase-shift mask and top anti-reflector process
- T.A. Brunner
- P.N. Sanda
- et al.
- 1993
- Microlithography 1993
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22 results at Microlithography 1993
Comparison of scalar and vector diffraction modelling for deep-UV lithography
- Bruce W. Smith
- Donis G. Flagello
- et al.
- 1993
- Microlithography 1993
TAR processing for CD control in I-line and 248 nm lithography
- Christopher Lyons
- Nicholas Eib
- et al.
- 1993
- Microlithography 1993
Rim phase-shift mask combined with off-axis illumination: A path to 0.5Λ/NA geometries
- T.A. Brunner
- 1993
- Microlithography 1993
Vector diffraction analysis of phase-mask imaging in photoresist films
- Donis G. Flagello
- Alan E. Rosenbluth
- 1993
- Microlithography 1993
Process optimization of APEX-E
- Karen Petrillo
- 1993
- Microlithography 1993
Post-exposure bake as a process-control parameter for chemically-amplffied photoresist
- John L. Sturtevant
- Steven J. Holmes
- et al.
- 1993
- Microlithography 1993
Developments in 2D AFM metrology
- Diana Nyyssonen
- 1993
- Microlithography 1993
Process latitude study of focused ion-beam-deposited gold for clear x-ray mask repair
- Patricia G. Blauner
- Andrew D. Dubner
- et al.
- 1993
- Microlithography 1993
Mixed e-beam/optical lithography process for the fabrication of sub-0.25-μm poly gates
- Keith T. Kwietniak
- Michael G. Rosenfield
- et al.
- 1993
- Microlithography 1993