Bridging CD metrology gaps of advanced patterning with assistance of nanomolding
- Narender Rana
- Dario Goldfarb
- 2012
- SPIE Advanced Lithography 2012
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15 results at SPIE Advanced Lithography 2012
High order wafer alignment in manufacturing
- Michael Pike
- Nelson Felix
- et al.
- 2012
- SPIE Advanced Lithography 2012
Measurement of placement error between self-assembled polymer patterns and guiding chemical prepatterns
- Gregory S. Doerk
- Chi-Chun Liu
- et al.
- 2012
- SPIE Advanced Lithography 2012
Progress towards the integration of optical proximity correction and directed self-assembly of block copolymers with graphoepitaxy
- Chi-Chun Liu
- Jed Pitera
- et al.
- 2012
- SPIE Advanced Lithography 2012
Directed self-assembly defectivity assessment. Part II
- Chris Bencher
- He Yi
- et al.
- 2012
- SPIE Advanced Lithography 2012