High order wafer alignment in manufacturing
- Michael Pike
- Nelson Felix
- et al.
- 2012
- SPIE Advanced Lithography 2012
Publications
Date
Featured collections
Popular topics
15 results at SPIE Advanced Lithography 2012
Dose-focus monitor technique using CD-SEM and application to local variation analysis
- Shoji Hotta
- Timothy Brunner
- et al.
- 2012
- SPIE Advanced Lithography 2012
Directed self-assembly defectivity assessment. Part II
- Chris Bencher
- He Yi
- et al.
- 2012
- SPIE Advanced Lithography 2012
Progress towards the integration of optical proximity correction and directed self-assembly of block copolymers with graphoepitaxy
- Chi-Chun Liu
- Jed Pitera
- et al.
- 2012
- SPIE Advanced Lithography 2012
Measurement of placement error between self-assembled polymer patterns and guiding chemical prepatterns
- Gregory S. Doerk
- Chi-Chun Liu
- et al.
- 2012
- SPIE Advanced Lithography 2012