Extending the compositional diversity of films in area selective atomic layer deposition through chemical functionalities
- Magi Mettry
- Alexander E. Hess
- et al.
- 2019
- JVSTA
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176 results at JVSTA
Achieving ultrahigh etching selectivity of SiO2 over Si3N4 and Si in atomic layer etching by exploiting chemistry of complex hydrofluorocarbon precursors
- Kang Yi Lin
- Chen Li
- et al.
- 2018
- JVSTA
Review Article: Stress in thin films and coatings: Current status, challenges, and prospects
- Grégory Abadias
- Eric Chason
- et al.
- 2018
- JVSTA
Effects of cesium ion implantation on the mechanical and electrical properties of porous SiCOH low- k dielectrics
- Weiyi Li
- Dongfei Pei
- et al.
- 2017
- JVSTA
Effects of ultraviolet and vacuum ultraviolet synchrotron radiation on organic underlayers to modulate line-edge roughness of fine-pitch poly-silicon patterns
- Hiroyuki Miyazoe
- Sebastian U. Engelmann
- et al.
- 2017
- JVSTA
Cyclic Cl2/H2 quasi-atomic layer etching approach for TiN and TaN patterning using organic masks
- Nathan Marchack
- J. M. Papalia
- et al.
- 2017
- JVSTA
Early example of an interdisciplinary approach in industry: Harold F. Winters's contributions
- Eric Kay
- John W. Coburn
- 2017
- JVSTA
Atomic layer deposited ultrathin metal nitride barrier layers for ruthenium interconnect applications
- Sonal Dey
- Kai-Hung Yu
- et al.
- 2017
- JVSTA
Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
- Ashish Jagtiani
- Hiroyuki Miyazoe
- et al.
- 2016
- JVSTA
Application of cyclic fluorocarbon/argon discharges to device patterning
- Dominik Metzler
- Kishore Uppireddi
- et al.
- 2016
- JVSTA