Publications

221 results at Microelectronic Engineering

Application of variable shaped electron beam technology to the development of 0.5 micron CMOS technology with extensions to 0.25 micron
- - P. Coane
  - P. Rudeck
  - et al.
- 1989
- Microelectronic Engineering
Nanolithography at 350 KV in a TEM
- - A.N. Broers
  - A.E. Timbs
  - et al.
- 1989
- Microelectronic Engineering
X-ray transmission through low atomic number particles
- - R.A. DellaGuardia
  - David Seeger
  - et al.
- 1989
- Microelectronic Engineering
Using surface wave produced plasmas to determine the frequency effect upon etching of polyimide in RF and microwave sustained plasmas
- - G. Sauvé
  - M. Moisan
  - et al.
- 1989
- Microelectronic Engineering
A Single Expose Double Develop (SEDD) process for self-aligned lithographic applications
- - Donis Flagello
  - Andrew Pomerene
- 1989
- Microelectronic Engineering
Fully scaled 0.5 μm MOS circuits by synchrotron radiation X-ray lithography: Devices fabrication and overlay evaluation
- - J. Silverman
  - V. Dimilia
  - et al.
- 1989
- Microelectronic Engineering
The use of organosilicon polymers in multilayer plasma resist processing
- - J. Paraszczak
  - E. Babich
  - et al.
- 1987
- Microelectronic Engineering
Electrical resistivity and radiation damage in boro-hydro-nitride x-ray lithography mask substrates
- - S.S. Dana
  - J. Batey
  - et al.
- 1987
- Microelectronic Engineering
Fabrication by tri-level electron beam lithography of X-ray masks with 50nm linewidths, and replication by X-ray nanolithography
- - Erik H. Anderson
  - D. Kern
  - et al.
- 1987
- Microelectronic Engineering
A comparison of the E-beam and UV-sensitivities and relative O₂- plasma stabilities of organosilicon polymers.Part II. Lithographic characteristics of polysilphenylene siloxanes and some organic polymers with pendant silyl groups
- - E. Babich
  - J.M. Shaw
  - et al.
- 1987
- Microelectronic Engineering