A Single Expose Double Develop (SEDD) process for self-aligned lithographic applications
- Donis Flagello
- Andrew Pomerene
- 1989
- Microelectronic Engineering
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221 results at Microelectronic Engineering
High speed electron beam testing
- George Chiu
- Jean-Marc Halbout
- et al.
- 1989
- Microelectronic Engineering
Fully scaled 0.5μm MOS circuits by synchrotron radiation X-ray lithography: Mask fabrication and chraterization
- R. Viswanathan
- R.E. Acosta
- et al.
- 1989
- Microelectronic Engineering
X-ray transmission through low atomic number particles
- R.A. DellaGuardia
- David Seeger
- et al.
- 1989
- Microelectronic Engineering
Nanolithography at 350 KV in a TEM
- A.N. Broers
- A.E. Timbs
- et al.
- 1989
- Microelectronic Engineering
Fully scaled 0.5 μm MOS cicuits by synchroton X-ray lithography: Resist systems and line width control
- David Seeger
- K.T. Kwietniak
- et al.
- 1989
- Microelectronic Engineering
Electrical resistivity and radiation damage in boro-hydro-nitride x-ray lithography mask substrates
- S.S. Dana
- J. Batey
- et al.
- 1987
- Microelectronic Engineering
A comparison of the E-beam and UV-sensitivities and relative O2- plasma stabilities of organosilicon polymers.Part II. Lithographic characteristics of polysilphenylene siloxanes and some organic polymers with pendant silyl groups
- E. Babich
- J.M. Shaw
- et al.
- 1987
- Microelectronic Engineering
Fabrication by tri-level electron beam lithography of X-ray masks with 50nm linewidths, and replication by X-ray nanolithography
- Erik H. Anderson
- D. Kern
- et al.
- 1987
- Microelectronic Engineering
Resist image enhancement by UV-, soft vacuum pulsed electron beams and organometallic compounds
- Hiroyuki Hiraoka
- 1987
- Microelectronic Engineering