A comparison of electrical and physical properties of MOCVD hafnium silicate thin films deposited using various silicon precursors
- P. Jamison
- M. Copel
- et al.
- 2006
- MRS Spring Meeting 2006
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.