Feature-Size Dependence of Etch Rate in Reactive Ion Etching
- Young H. Lee
- Zhen H. Zhou
- 2019
- JES
Publications
509 results at JES
Surface Modifications of Electronic Materials Induced by Plasma Etching
- G.S. Oehrlein
- S.W. Robey
- et al.
- 2019
- JES
Thermally Developable, Positive Resist Systems with High Sensitivity
- Hiroshi Ito
- Reinhold Schwalm
- 2019
- JES
Hexachlorodisilane as a Precursor in the LPCVD of Silicon Dioxide and Silicon Oxynitride Films
- R.C. Taylor
- B.A. Scott
- 2019
- JES
low Temperature Silicon Epitaxy by Hot Wall Ultrahigh Vacuum/Low Pressure Chemical Vapor Deposition Techniques: Surface Optimization
- B.S. Meyerson
- E. Ganin
- et al.
- 2019
- JES
Thermally Developable, Positive Tone, Oxygen RIE Barrier Resist for Bilayer Lithography
- Hiroshi Ito
- Mitsuru Ueda
- et al.
- 2019
- JES
Measurement of Thin-Film Dissolution Kinetics using a Quartz Crystal Microbalance
- W.D. Hinsberg
- C.G. Willson
- et al.
- 2019
- JES
Corrosion of Thin Film Magnetic Disk: Galvanic Effects of the Carbon Overcoat
- D. Edmonson
- Michael A. Russak
- et al.
- 2019
- JES
Acceleration Factors for the Decomposition of Thermally Grown SiO2 Films
- S.I. Raider
- 2019
- JES
Dependence of the Flatband Voltage of Si-MOS on Distribution of Cesium in SiO2 Comparison of Two Implantation Methods
- L. Krusin-Elbaum
- 2019
- JES