Reactive Ion Etching of Sputter Deposited Tantalum Oxide and its Etch Selectivity to Tantalum
- Yue Kuo
- 2019
- JES
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Dependence of the Flatband Voltage of Si-MOS on Distribution of Cesium in SiO2 Comparison of Two Implantation Methods
- L. Krusin-Elbaum
- 2019
- JES
A Study of the Copper/Cyanide Solution Interphase by Polarization Modulated FT-IR Spectroscopy
- J.G. Gordon
- W.G. Golden
- et al.
- 2019
- JES
Production and Characterization of Extremely Corrosion Resistant Chromium-Metalloid Alloys
- R.M. Latanision
- R.R. Ruf
- 2019
- JES
In Situ X-Ray Absorption Study of Chromium Valency Changes in Passive Oxides on Sputtered ALCr Thin Films Under Electrochemical Control
- A.J. Davenport
- H.S. Isaacs
- et al.
- 2019
- JES
The Effect of Cyanide on the Oxidation of Formaldehyde on Au, Cu, and Pd Electrodes
- Jean Horkans
- 2019
- JES
Interaction Between ti and SiO2
- C.-Y. Ting
- M. Wittmer
- et al.
- 2019
- JES
Critical angles for channeling of boron ions implanted into single-crystal silicon
- Chanahae Park
- Kevin M. Klein
- et al.
- 2019
- JES
Epitaxial Growth of GaAs with (C2H5)2GaCl and AsH3 in a Hotwall Reactor
- T.F. Kuech
- M.A. Tischler
- et al.
- 2019
- JES
Substituent Effect on Para-Substituted n-phenylpyrrole Monomers and Their Polyheterocyclic Conductors
- M.C. Rock
- Ma. Eugenia Carbajal
- et al.
- 2019
- JES