Material reactions in Al/Pd2Si/Si junctions. I. Phase stability
- U. Köster
- P.S. Ho
- et al.
- 1982
- Journal of Applied Physics
Publications
Date
Featured collections
Popular topics
2357 results at Journal of Applied Physics
A simple analysis of inert marker motion in a single compound layer for solid-phase epitaxy and for binary diffusion couples
- U. Gösele
- K.N. Tu
- et al.
- 1982
- Journal of Applied Physics
Weak ferromagnetism and domain wall motion in a linear magnetic polymer
- J.C. Scott
- C.B. Zimm
- et al.
- 1982
- Journal of Applied Physics
Measurement of thermal diffusivity using a pyroelectric detector
- C.E. Yeack
- R.L. Melcher
- et al.
- 1982
- Journal of Applied Physics
A study of vanadium as diffusion barrier between aluminum and gadolinium silicide contacts
- M. Eizenberg
- R.D. Thompson
- et al.
- 1982
- Journal of Applied Physics
Stray magnetic coupling between neighboring superconducting memory cells in dense arrays of Josephson interferometers
- H. Jaeckel
- D.F. Moore
- 1982
- Journal of Applied Physics
Formation of shallow silicide contacts of high Schottky barrier on Si: Alloying Pd and Pt with W versus alloying Pd and Pt with Si
- M. Eizenberg
- K.N. Tu
- 1982
- Journal of Applied Physics
Material reactions Al/Pd2Si/Si junctions. II. Kinetic rates
- P.S. Ho
- J.E. Lewis
- et al.
- 1982
- Journal of Applied Physics
Thermal stability of Pb-alloy Josephson junction electrode materials. V. Effects of repeated cycling between 298 and 4.2 K of Pb-Bi counter electrode
- Masanori Murakami
- J.H. Basson
- 1982
- Journal of Applied Physics
Investigation of thermally stimulated luminescence and its description by a tunneling model
- P. Thioulouse
- E.A. Giess
- et al.
- 1982
- Journal of Applied Physics